![SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - <title>When is bilayer thin-film imaging suitable: comparison with single-layer resists</title>]()
SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Optical Microlithography XIV - <title>When is bilayer thin-film imaging suitable: comparison with single-layer resists</title>Halle, Scott; Thomas, Alan C.; Armacost, Michael; Dalton, Timothy J.; Chen, Xiaochun; Bukofsky, Scott J.; Genz, Oliver; Lu, Zhijian G.; Butt, Shahid A.; Chen, Zheng; Ferguson, Richard A.; Coker, Eric; Leidy, Robert K.; Lin, Qinghuang; Mahorowala, Arpan P.; Babich, Katherina; Petrillo, Karen E.; Angelopoulos, Marie; Ignatowicz, Mark; Bui, Bang; Progler, Christopher J. · 2001