Letters to the Editor
- 期刊名称Russian Review
- 作者Alexandre Tarsaidze, Stefan T. Possony and Ralph Carter Elwood
- 卷第24卷
- 期第4期
- 印刷ISSN0036-0341
- 电子ISSN1467-9434
- 文件大小417.46KB
- 发表时间1965-10
- DOI10.2307/126948
- 页码438-442
Direct evidence of arsenic clustering in high dose arsenic‐implanted siliconWu, N. R.; Sadana, D. K.; Washburn, J. · 1984
Mechanisms of arsenic clustering in siliconKomarov, F.; Velichko, O.; Dobrushkin, V.; Mironov, A. · 2006
Clustering equilibrium and deactivation kinetics in arsenic doped siliconNobili, D.; Solmi, S.; Shao, J. · 2001
Rutherford Backscattering (RBS) and Channeling Studies of Defects in Arsenic Implanted Silicon Induced by Arsenic ClusteringBaiocchi, Frank A.; Kamgar, Avid · MRS Proceedings · 1986
Clustering Kinetics of Arsenic and Phosphorus in Laser Annealed SiliconGoetzlich, Josef · MRS Proceedings · 1985
Reverse annealing, clustering, and electron mobility in arsenic doped siliconSolmi, S.; Nobili, D.; Shao, J. · 2000
High concentration diffusivity and clustering of arsenic and phosphorus in siliconSolmi, S.; Nobili, D. · 1998
Etch Rate Characterization of Borosilicate Glasses as Diffusion SourcesSchwenker, R. O. · Journal of The Electrochemical Society · 1971
Diffusion of arsenic along dislocations in epitaxial silicon filmsDavid R. Campbell; K.N. Tu; Robert O. Schwenker · 1975
Propagation of 1-µm Bubbles in Contiguous Disk DevicesK. Ju; H. L. Hu; R. G. Hirko; E. B. Moore; D. Y. Saiki; R. O. Schwenker · 1981
Effects of conductor passivation on bubble propagation in contiguous disk devicesHorng, C. T.; Schwenker, R. O. · Journal of Applied Physics · 1981
Effects of ion implantation on substrate hardening and film stress reduction and their effect on the yield of bipolar transistorsHu, S. M.; Schwenker, R. O. · Journal of Applied Physics · 1978
Electro-rheologyBlock, H; Kelly, J P · Journal of Physics D: Applied Physics · 1988
Semiconductor nanowiresLu, Wei; Lieber, Charles M · Journal of Physics D: Applied Physics · 2006
Nanoassembled model catalystsHeiz, Ueli; Schneider, Wolf-Dieter · Journal of Physics D: Applied Physics · 2000
Mechanisms for exchange biasStamps, R L · Journal of Physics D: Applied Physics · 2000
Thermal plasma waste treatmentHeberlein, Joachim; Murphy, Anthony B · Journal of Physics D: Applied Physics · 2008
Surface enhanced fluorescenceFort, Emmanuel; Grésillon, Samuel · Journal of Physics D: Applied Physics · 2008
Nanocomposite dielectrics—properties and implicationsNelson, J K; Hu, Y · Journal of Physics D: Applied Physics · 2005
Memristor-based neural networksThomas, Andy · Journal of Physics D: Applied Physics · 2013