SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - <title>Status of 157 nm lithography and prospects for immersion</title>Fujii, Kiyoshi; Hagiwara, Takuya; Matsuura, Seiji; Ishimaru, Toshiyuki; Matsubara, Yoshihisa; Wakamiya, Wataru; Smith, Bruce W. · 2005

SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Optical Microlithography XVIII - Current status of 157-nm lithography using a full-field scannerIshimaru, Toshiyuki; Smith, Bruce W.; Matsuura, Seiji; Seki, Miyoshi; Fujii, Kiyoshi; Koizumi, Ryo; Hakataya, Yuji; Moriya, Akihiko · 2005

The Electronic Journal: The Future of Serials-Based Informationby Brian CookReview by: Walter J. Trybula · Libraries & Culture · 1996

SPIE Proceedings [SPIE Photomask 2001 - Monterey, CA (Wednesday 3 October 2001)] 21st Annual BACUS Symposium on Photomask Technology - <title>Financial impact of technology acceleration on semiconductor masks</title>Trybula, Walter J.; Kimmel, Kurt R.; Grenon, Brian J.; Dao, Giang T.; Grenon, Brian J. · 2002

SPIE Proceedings [SPIE Advanced Microelectronic Manufacturing - Santa Clara, CA (Sunday 23 February 2003)] Cost and Performance in Integrated Circuit Creation - Does technology acceleration equate to mask cost acceleration?Trybula, Walter J.; Wong, Alfred K. K.; Monahan, Kevin M.; Grenon, Brian J. · 2003

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Metrology, Inspection, and Process Control for Microlithography XVII - <title>Challenges of image placement and overlay at the 90-nm and 65-nm nodes</title>Trybula, Walter J.; Herr, Daniel J. · 2003

[ACM Press the 31st conference - Phoenix, Arizona, United States (1999.12.05-1999.12.08)] Proceedings of the 31st conference on Winter simulation Simulation---a bridge to the future - WSC '99 - Operational simulation of an x-ray lithography cellWhite, K. Preston; Trybula, Walter J. · 1999