![[IEEE International Workshop on Numerical Modeling of processes and Devices for Integrated Circuits: NUPAD V - Honolulu, HI, USA (5-6 June 1994)] Proceedings of International Workshop on Numerical Modeling of processes and Devices for Integrated Circuits: NUPAD V - Modeling of Ti physical vapor deposition systems]()
[IEEE International Workshop on Numerical Modeling of processes and Devices for Integrated Circuits: NUPAD V - Honolulu, HI, USA (5-6 June 1994)] Proceedings of International Workshop on Numerical Modeling of processes and Devices for Integrated Circuits: NUPAD V - Modeling of Ti physical vapor deposition systemsBang, D.S.; McVittie, J.P.; Islamraja, M.M.; Saraswat, K.C.; Krivokapic, Z.; Cheung, R. · 1994