Negative ion assisted silicon oxidation with transformer coupled RF bias
- 作者H. Shindo; T. Koromogawa; T. Fujii; K. Kusaba; Y. Horiike
- 印刷ISSN0257-8972
- 文件大小197.15KB
- 发表时间1999
- DOI10.1016/s0257-8972(99)00273-x
- 页码618-621
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