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Self-Cleaning Properties of TiO<sub>2</sub> Films Deposited by Reactive Magnetron Sputtering Using Smooth D.C. and Pulsed D.C. SourcePudwat, S.; Rakkwamsuk, P.; Damrongrattana, S. · Advanced Materials Research · 2008
The effect of argon pressure on the structural and photocatalytic characteristics of TiO2 thin films deposited by d.c. magnetron sputteringK. Eufinger; E.N. Janssen; H. Poelman; D. Poelman; R. De Gryse; G.B. Marin · 2006
Influence of Process Parameters on the Properties of TiO<sub>2</sub> Films Deposited by a D.C. Magnetron Sputtering System on Glass SupportS. L. Toma; C. Bejinariu; E. Lucian; I. G. Sandu; B. F. Toma · 2015