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THE IMPACT OF FAMILY CONTINUITY ON RELIGIOUS ORGANIZATIONS: A CASE STUDYPHILLIP R. KUNZ and Philip R. Kunz · International Journal of Sociology of the Family · 1999

Photoresists for 193-nm lithographyR. D. Allen; G. M. Wallraff; D. C. Hofer; R. R. Kunz · 1997

Outlook for 157 nm resist designR. R. Kunz; T. M. Bloomstein; D. E. Hardy; R. B. Goodman; D. K. Downs; J. E. Curtin · 1999

Social Support During the Process of DivorceKunz, Jenifer; Kunz, Phillip R. · Journal of Divorce & Remarriage · 1996

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Particle Transfer Reactions on Deformed NucleiKunz, P. D.; Rost, E.; Johnson, R. R. · Physical Review · 1969

Progress in 193 nm Positive Resists.ALLEN, R. D.; SOORIYAKUMARAN, R.; OPITZ, J.; WALLRAFF, G. M.; BREYTA, G.; DIPIETRO, R. A.; HOFER, D. C.; KUNZ, R. R.; OKOROANYANWU, U.; WILLSON, C. G. · Journal of Photopolymer Science and Technology · 1996

Charge transport in magnetronsRossnagel, S. M. · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · 1987

Biomolecules and surfacesRatner, Buddy D. · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · 1990

Studies in differential chargingBarr, Tery L. · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · 1989

Material selection for hard coatingsHolleck, H. · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · 1986

Hollow cathode magnetronWang, Zhehui; Cohen, Samuel A. · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · 1999

Nanostructured materials for supercapacitorsMeyyappan, M. · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · 2013

Design of functional coatingsHegemann, D.; Oehr, C.; Fischer, A. · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · 2005

Depth profile optimizationNaumkin, A. V. · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · 1994