![SPIE Proceedings [SPIE SPIE Lithography Asia - Taipei, Taiwan (Wednesday 18 November 2009)] Lithography Asia 2009 - Regularization of inverse photomask synthesis to enhance manufacturability]()
SPIE Proceedings [SPIE SPIE Lithography Asia - Taipei, Taiwan (Wednesday 18 November 2009)] Lithography Asia 2009 - Regularization of inverse photomask synthesis to enhance manufacturabilityChen, Alek C.; Jia, Ningning; Wong, Alfred K.; Han, Woo-Sung; Lin, Burn J.; Lam, Edmund Y.; Yen, Anthony · 2009