Production of noble gas ion beams in a focused ion beam machine using an electron beam ion trap
- 作者F. Ullmann; F. Grossmann; V. P. Ovsyannikov; J. Gierak; E. Bourhis; J. Ferré; J. P. Jamet; A. Mougin; G. Zschornack
- 文件大小1097.79KB
- 发表时间2007
- DOI10.1116/1.2799971
Lithographic characterization of the flare in the Berkeley 0.3 numerical aperture extreme ultraviolet microfield opticJ. P. Cain; P. P. Naulleau; E. M. Gullikson; C. J. Spanos · 2006
Extreme ultraviolet microexposures at the Advanced Light Source using the 0.3 numerical aperture micro-exposure tool opticP. P. Naulleau; K. A. Goldberg; E. Anderson; J. P. Cain; P. Denham; K. Jackson; A. Morlens; S. Rekawa; F. Salmassi · 2004
Lithographic characterization of the field dependent astigmatism and alignment stability of a 0.3 numerical aperture extreme ultraviolet microfield opticP. P. Naulleau; J. P. Cain; K. A. Goldberg · 2005
Characterization of the synchrotron-based 0.3 numerical aperture extreme ultraviolet microexposure tool at the Advanced Light SourceP. Naulleau; J. P. Cain; E. Anderson; K. Dean; P. Denham; K. A. Goldberg; B. Hoef; K. Jackson · 2005
Resist-based measurement of the contrast transfer function in a 0.3 numerical aperture extreme ultraviolet microfield opticJ. P. Cain; P. Naulleau; C. J. Spanos · 2006