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[IEEE 2018 IEEE International Interconnect Technology Conference (IITC) - Santa Clara, CA, USA (2018.6.4-2018.6.7)] 2018 IEEE International Interconnect Technology Conference (IITC) - IITC 2018 Keynote Title CMOS/Cu BEOL Technology in Manufacturing: 20 Years and C2018
[IEEE 2010 IEEE International Interconnect Technology Conference - IITC - Burlingame, CA, USA (2010.06.6-2010.06.9)] 2010 IEEE International Interconnect Technology Conference - Development of low temperature dielectrics down to 150°C for multiple TSVs structure with Wafer-on-Wafer (WOW) technologyKitada, H.; Maeda, N.; Fujimoto, K.; Mizushima, Y.; Nakata, Y.; Nakamura, T.; Lee, W.; Kwon, Y-S.; Ohba, T. · 2010
[IEEE IEEE International Interconnect Technology Conference - Burlingame, CA, USA (2-4 June 2003)] Proceedings of the IEEE 2003 International Interconnect Technology Conference (Cat. No.03TH8695) - The application of ALD WN/sub x/C/sub y/ as a copper diffusion barrierSmith, S.; Book, G.; Li, W.M.; Sun, Y.M.; Gillespie, P.; Tuominen, M.; Pfeifer, K. · 2003
[IEEE IEEE 2002 International Interconnect Technology Conference - Burlingame, CA, USA (3-5 June 2002)] Proceedings of the IEEE 2002 International Interconnect Technology Conference (Cat. No.02EX519) - Deposition of WN/sub x/C/sub y/ thin films by ALCVD/spl trade/ method for diffusion barriers in metallizationWei-Min Li, ; Kai Elers, ; Juhana Kostamo, ; Kaipio, S.; Huotari, H.; Soininen, M.; Soininen, P.J.; Tuominen, M.; Haukka, S.; Smith, S.; Besling, W. · 2002
[IEEE 2015 IEEE International Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM) - Grenoble, France (2015.5.18-2015.5.21)] 2015 IEEE International Interconnect Technology Conference and 2015 IEEE Materials for Advanced Metallization Conference (IITC/MAM) - Influence of alloying elements on the phase formation of ultrathin Ni (<10nm) on Si(001) substratesGeenen, F. A.; Van Stiphout, K.; Jordan-Sweef, J.; Vantomme, A.; Lavoie, C.; Detavernier, C. · 2015
[IEEE 2011 Materials for Advanced Metallization (MAM) - Dresden, Germany (2011.05.8-2011.05.12)] 2011 IEEE International Interconnect Technology Conference - Temporary passivation of Cu for low temperature (< 300°C) 3D wafer stackingLim, D. F.; Wei, J.; Leong, K. C.; Tan, C. S. · 2011
[IEEE 2011 Materials for Advanced Metallization (MAM) - Dresden, Germany (2011.05.8-2011.05.12)] 2011 IEEE International Interconnect Technology Conference - Thermal stability and interface improvement of thin NiSiGe by C<sup>+</sup> ion implantationZhang, B.; Yu, W.; Zhao, Q.T.; Buca, D.; Hollander, B.; Hartmann, J.-M.; Zhang, M.; Wang, X.; Mantl, S. · 2011
[IEEE 4th International Conference on Solid-State and IC Technology - Beijing, China (24-28 Oct. 1995)] Proceedings of 4th International Conference on Solid-State and IC Technology - A modified model of high-T/sub c/ superconducting interconnect propagation characteristics for VLSI packagingJinfeng Kang, ; Ruqi Han, ; Yangyuan Wang, · 1995
CPW-fed cusp antennaE. A. Soliman; S. Brebels; E. Beyne; G. A. E. Vandenbosch · 1999
Performance analysis of MCM systemsC. Truzzi; E. Beyne; E. Ringoot · 1997
Zink und CadmiumO. Hackl; L. Dede; J. W. Springer; K. Kieper; E. Olivier; C. Boy; E. Beyne; H. Mohler; R. Widmer; Snell; C. V. Bordeianu; K. Chalupny; K. Breisch; L. L. de Koninck; A. Ludwig; E. Nyman; L. Lorck Hagen; L. R. Raymond; W. V. Brumbaugh; E. Leroy Adkins; A. Fiévet; Iw. Tananaeff; E. Knoppick; St. von Bogdandy; M. Polanyi; H. N. Merr; H. F. Bradley; P. B. Sarkar; B. K. Datta-Ray; W. H. Keefe; I. L. Newell · 1933
Sequential-rotation arrays of circularly polarized aperture antennas in the MCM-D technologyE. A. Soliman; S. Brebels; E. Beyne; G. A. E. Vandenbosch · 2005
Atteinte pulmonaire du syndrome de SweetL. Astudillo; L. Sailler; O. Beyne-Rauzy; M. Alvarez; B. Couret; E. Arlet-Suau · 2003
Brick-wall antenna in multilayer thin-film technologyE. A. Soliman; S. Brebels; E. Beyne; P. Delmotte; G. Vandenbosch · 1998
Electromigration: Investigation of heterogeneous systemsB. Vanhecke; L. De Schepper; W. De Ceuninck; V. D'Haeger; M. D'Olieslaegers; E. Beyne; J. Roggen; L. Stals · 1993
Broadband modeling and transient analysis of MCM interconnectionsPeeters, J.; Beyne, E. · IEEE Transactions on Components, Packaging, and Manufacturing Technology: Part B · 1994