![[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - Medium energy ion scattering analysis of damage in silicon caused by ultra-low energy boron implantation at different substrate temperatures]()
[IEEE 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 - Alpbach, Austria (17-22 Sept. 2000)] 2000 International Conference on Ion Implantation Technology Proceedings. Ion Implantation Technology - 2000 (Cat. No.00EX432) - Medium energy ion scattering analysis of damage in silicon caused by ultra-low energy boron implantation at different substrate temperaturesShenjun Zhang, ; Berg, J.A.V.D.; Armour, D.G.; Whelan, S.; Goldberg, R.G.; Bailey, P.; Noakes, T.C.Q. · 2000