Molecular Informatics Going “Fully Online”
- 期刊名称Molecular Informatics
- 作者Baumann, Knut; Ecker, Gerhard F.; Mestres, Jordi; Schneider, Gisbert
- 卷第33卷
- 期第1期
- 印刷ISSN1868-1743
- 文件大小335.46KB
- 发表时间2014-01
- DOI10.1002/minf.201480131
- 页码2-2
ChemInform Abstract: Silicon Dioxide Deposition by Atmospheric Pressure and Low-Temperature CVD Using TEOS and Ozone.FUJINO, K.; NISHIMOTO, Y.; TOKUMASU, N.; MAEDA, K. · ChemInform · 1990
[IEEE 1991 Eighth International IEEE VLSI Multilevel Interconnection Conference - Santa Clara, CA, USA (11-12 June 1991)] 1991 Proceedings Eighth International IEEE VLSI Multilevel Interconnection Conference - Reaction mechanism of TEOS and O/sub 3/ atmospheric pressure CVDFujino, K.; Nishimoto, Y.; Tokumasu, N.; Maeda, K. · 1991
[IEEE Proceedings., Sixth International IEEE VLSI Multilevel Interconnection Conference - Santa Clara, CA, USA (12-13 June 1989)] Proceedings., Sixth International IEEE VLSI Multilevel Interconnection Conference - Dielectric film deposition by atmospheric pressure and low temperature CVD using TEOS, ozone, and new organometallic doping sourcesNishimoto, Y.; Tokumasu, N.; Fujino, K.; Maeda, K. · 1989