![SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - <title>Novolak design for high-resolution positive photoresists (IV): tandem-type novolak resin for high-performance positive photoresists</title>]()
SPIE Proceedings [SPIE Advances in Resist Technology and Processing VIII - San Jose, United States (Monday 4 March 1991)] Advances in Resist Technology and Processing VIII - <title>Novolak design for high-resolution positive photoresists (IV): tandem-type novolak resin for high-performance positive photoresists</title>Hanabata, Makoto; Oi, F.; Furuta, Akihiro; Ito, Hiroshi · 1991