Interface of atomic layer deposited HfO[sub 2] films on GaAs (100) surfacesHackley, Justin C.; Demaree, J. Derek; Gougousi, Theodosia · Applied Physics Letters · 2008

Growth and Interface Evolution of HfO[sub 2] Films on GaAs(100) SurfacesGougousi, Theodosia; Hackley, Justin C.; Demaree, J. Derek; Lacis, John W. · Journal of The Electrochemical Society · 2010

Atomic Layer Deposition of HfO2 Thin Films on Si and GaAs SubstratesHackley, Justin C; Demaree, J. Derek; Gougousi, Theodosia · MRS Proceedings · 2008

Nucleation of HfO[sub 2] atomic layer deposition films on chemical oxide and H-terminated SiHackley, Justin C.; Gougousi, Theodosia; Demaree, J. Derek · Journal of Applied Physics · 2007

Growth and interface of HfO[sub 2] films on H-terminated Si from a TDMAH and H[sub 2]O atomic layer deposition processHackley, Justin C.; Demaree, J. Derek; Gougousi, Theodosia · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · 2008

Ultra Thin Flexible Glass SubstratesPlichta, Armin; Weber, Andreas; Habeck, Andreas · MRS Proceedings · 2003

Principles of Ion MixingMatteson, S.; Nicolet, M.-A. · MRS Proceedings · 1981

Phase Transitions in Pure PlutoniumMitchell, Jeremy N.; Freibert, Franz, J.; Schwartz, Daniel S. · MRS Proceedings · 2012

Spintronics in NitridesDietl, Tomasz · MRS Proceedings · 2004

Dielectric Relaxation Of Semicrystalline PolyimidesHuo, Pengtao; Friler, Jerome; Cebe, Peggy · MRS Proceedings · 1991

Carbon Aerogels and XerogelsPekala, Richard W.; Alviso, Cynthia T. · MRS Proceedings · 1992

Why Covalent Ceramics are HardGilman, John J. · MRS Proceedings · 1993

Microwave Processing of Ceramics - An OverviewSutton, Willard H. · MRS Proceedings · 1992