![SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Modeling OPC complexity for design for manufacturability]()
SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Modeling OPC complexity for design for manufacturabilityGupta, Puneet; Weed, J. Tracy; Martin, Patrick M.; Kahng, Andrew B.; Muddu, Swamy; Nakagawa, Sam; Park, Chul-Hong · 2005