Plasma abatement of perfluorocompounds in inductively coupled plasma reactorsXu, Xudong “Peter”; Rauf, Shahid; Kushner, Mark J. · 2000

Model for noncollisional heating in inductively coupled plasma processing sourcesRauf, Shahid; Kushner, Mark J. · Journal of Applied Physics · 1997

Diagnostic technique for measuring plasma parameters near surfaces in radio frequency dischargesRauf, Shahid; Kushner, Mark J. · Applied Physics Letters · 1998

The effect of radio frequency plasma processing reactor circuitry on plasma characteristicsRauf, Shahid; Kushner, Mark J. · Journal of Applied Physics · 1998

Dynamics of a coplanar-electrode plasma display panel cell. I. Basic operationRauf , Shahid; Kushner , Mark J. · Journal of Applied Physics · 1999

Argon metastable densities in radio frequency Ar, Ar/O2 and Ar/CF4 electrical dischargesRauf, Shahid; Kushner, Mark J. · 1997

Controller design issues in the feedback control of radio frequency plasma processing reactorsRauf, Shahid; Kushner, Mark J. · Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films · 1999

Electro-rheologyBlock, H; Kelly, J P · Journal of Physics D: Applied Physics · 1988

Semiconductor nanowiresLu, Wei; Lieber, Charles M · Journal of Physics D: Applied Physics · 2006

Nanoassembled model catalystsHeiz, Ueli; Schneider, Wolf-Dieter · Journal of Physics D: Applied Physics · 2000

Mechanisms for exchange biasStamps, R L · Journal of Physics D: Applied Physics · 2000

Thermal plasma waste treatmentHeberlein, Joachim; Murphy, Anthony B · Journal of Physics D: Applied Physics · 2008

Surface enhanced fluorescenceFort, Emmanuel; Grésillon, Samuel · Journal of Physics D: Applied Physics · 2008

Nanocomposite dielectrics—properties and implicationsNelson, J K; Hu, Y · Journal of Physics D: Applied Physics · 2005

Memristor-based neural networksThomas, Andy · Journal of Physics D: Applied Physics · 2013