Time-resolved scanned electron beam annealing of ion-implanted polycrystalline silicon
- 作者E.F. Krimmel; A.G.K. Lutsch
- 卷第15卷
- 期第1期
- 印刷ISSN0026-2692
- 文件大小367.52KB
- 发表时间1984
- DOI10.1016/s0026-2692(84)80005-1
- 页码30-37
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