Effects of N2 Plasma Treatment on SiO2 Gate Insulator in a-Si:H Thin Film Transistor
- 期刊名称MRS Proceedings
- 作者Kim, Sung Chul; Bae, Sung Sig; Oh, Eui Yeol; Kim, Jeong Hyun; Lee, Jong Wan; Kim, Cha Yeon; Kim, Donggil
- 卷第336卷
- 电子ISSN1946-4274
- 文件大小337.91KB
- 发表时间1994-1
- DOI10.1557/proc-336-775
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