![Effect of Al[sub 2]O[sub 3] capping layer on suppression of interfacial SiO[sub 2] growth in HfO[sub 2]/ultrathin SiO[sub 2]/Si(001) structure]()
Effect of Al[sub 2]O[sub 3] capping layer on suppression of interfacial SiO[sub 2] growth in HfO[sub 2]/ultrathin SiO[sub 2]/Si(001) structureKundu, Manisha; Miyata, Noriyuki; Nabatame, Toshihide; Horikawa, Tsuyoshi; Ichikawa, Masakazu; Toriumi, Akira · Applied Physics Letters · 2003