SPIE Proceedings [SPIE Dry Etch Technology - San J, United States (Monday 9 September 1991)] Dry Etch Technology - ECR plasma and etch characterization of photoresist dry etch processes
- 作者Cho, Kyoung Y.; Im, Dong W.; Ranadive, Deepak
- 卷第1593卷
- 印刷ISSN0277-786X
- 文件大小596.19KB
- 发表时间1992
- DOI10.1117/12.56918
- 页码79-89
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