Book Review
- 期刊名称Journal of Information Techology for Teacher Education
- 卷第2卷
- 期第1期
- 印刷ISSN0962-029X
- 文件大小166.63KB
- 发表时间1993-01
- DOI10.1080/0962029930020109
- 页码111-112
Hydrogen plasma induced defects in siliconJeng, S. J.; Oehrlein, G. S.; Scilla, G. J. · Applied Physics Letters · 1988
Microstructural studies of reactive ion etched siliconJeng, S. J.; Oehrlein, G. S. · Applied Physics Letters · 1987
Chen <i>et al.</i> Reply:Chen, W. M.; Awadelkarim, O. O.; Monemar, B.; Lindström, J. L.; Oehrlein, G. S. · Physical Review Letters · 1998
Reactive ion etching of SiGe alloys using HBrT. D. Bestwick; G. S. Oehrlein; Y. Zhang; G. M. W. Kroesen; E. De Frésart · 1991
Study of photoresist etching and roughness formation in electron-beam generated plasmasB. J. Orf; S. G. Walton; D. Leonhardt; G. S. Oehrlein · 2007
Thermal donors and carbon<img src="http://onlinelibrarystatic.wiley.com/undisplayable_characters/00f8ff.gif" alt="[BOND]">oxygen defects in siliconJ. L. Lindström; H. Weman; G. S. Oehrlein · 1987
Surface Chemistry Studies of Copper Chemical Mechanical PlanarizationHernandez, J.; Wrschka, P.; Oehrlein, G. S. · Journal of The Electrochemical Society · 2001
Surface Modifications of Electronic Materials Induced by Plasma EtchingOehrlein, G. S. · Journal of The Electrochemical Society · 1989