海量图书期刊资源,随时随地畅享阅读乐趣
Characterization of phosphorus implanted low pressure chemical vapor deposited polycrystalline siliconGiora Yaron · 1979
Low Pressure Chemical Vapor Deposition of Silicon Carbide from DitertiarybutylsilaneGrow, J. M. · Journal of The Electrochemical Society · 1993
Low Pressure Chemical Vapor Deposition of Silicon Carbide from DiethylsilaneGrow, J. M. · Journal of The Electrochemical Society · 1993
Crystallization of amorphous silicon films during low pressure chemical vapor depositionKinsbron, E. · Applied Physics Letters · 1983
Crystallization of amorphous silicon–germanium films deposited by low pressure chemical vapor depositionD Guillet; M Sarret; L Haji; R Rogel; O Bonnaud · 2000
Phosphorus Doping of Low Pressure Chemically Vapor-Deposited Silicon FilmsMandurah, M. M. · Journal of The Electrochemical Society · 1979
Lateral diffusion of arsenic in low pressure chemical vapor deposited polycrystalline siliconLewis, N. · Applied Physics Letters · 1983
Control of Amorphous Silicon Crystallization Using Germanium Deposited by Low Pressure Chemical Vapor DepositionToita, Masato; Kalavade, Pranav; Saraswat, Krishna C. · MRS Proceedings · 2000
Visualizing substructural fingerprintsRobert D. Clark; David E. Patterson; Farhad Soltanshahi; James F. Blake; James B. Matthew · 2000
BacktalkJames M. Oswald, Joseph D. Novak, Harry S. Belman, R. C. Bates, William H. Fisher, Leo M. Schell, C. C. McEachern and Allen D. Patterson · The Phi Delta Kappan · 1967
Book reviewsMichelle Patterson; Tessa Blackstone; James A. Perkins; H. D. Law; Gareth Williams; Peter R. Fallon; Peter Armitage · 1975
Sectional notesLouis Soffcke; Julian C. Miller; Frank W. Hussey; E. L. Newdick; T. M. Patterson; Robert Schmidt; D. M. James · 1937
Guest editorialM.N. James; J.R. Yates; L. Susmel; F. Iacoviello; D. Nowell; P. Lazzarin; E.A. Patterson; A. Carpinteri · 2013
The physics of physical examinationsPatterson, James D. · The Physics Teacher · 1989
Is it difficult to teach physics?Patterson, James D. · American Journal of Physics · 1986
Proximity effect correction for nanolithographyRau, Richard · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1996
Lithography with 157 nm lasersBloomstein, T. M. · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1997
X-ray lithographyHeuberger, A. · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1988
Resolution limits of optical lithographyOkazaki, Shinji · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1991
Review of scanning force microscopySarid, Dror · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1991
Diamond nanorodsShenderova, O. A.; Padgett, C. W.; Hu, Z.; Brenner, D. W. · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 2005
Dielectric/semiconductor interfacesWieder, H. H. · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1993
Two-dimensional carrier profilingVandervorst, W. · Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures · 1992